FIS4-UHR Ultra-high Resolution Wavefront Sensor

In high-precision optical inspection, the resolution of wavefront measurement directly determines the ability to capture the surface details of optical components. The FIS4-UHR ultra-high-resolution wavefront sensor, developed by Professor Yang Yongying and her research team at Zhejiang University, utilizes four-wavefront lateral shearing interferometry technology. Without the need for a reference mirror, it can acquire bidirectional wavefront information in a single acquisition, enabling real-time measurements with nanometer-level accuracy and a wide dynamic range.

As the flagship product in the series, FIS4-UHR fully covers full-scene applications such as laser beam wavefront detection, adaptive optics, plane surface shape measurement, optical system calibration, optical window plate detection, optical plane, spherical surface shape measurement, and surface roughness detection. Whether it is mass production quality inspection of high-precision optical components or rigorous experiments in cutting-edge scientific research projects, it can provide stable and traceable nanometer-level measurement results.

Paired with our fully self-developed analysis software, users can view multi-dimensional data such as 3D topography, contour maps, and phase maps in real-time. With a single click, they can output core parameters like PV, RMS, PSF, and MTF. Additionally, users can customize measurement areas and dynamically capture waveform changes, making complex data analysis efficient and intuitive.

The FIS4-UHR ultra-high-resolution wavefront sensor adopts a fully domestically developed architecture throughout the entire process. It not only achieves performance that rivals the top international standards but also provides rapid response with localized technical support and customized services. It is not subject to the delivery cycles and technical limitations of overseas brands, truly offering users autonomous and controllable solutions.