Aberration measurement of optical systems

Help to find defects in optical systems and guide the improvement and optimization of optical design

A beam passing through an imperfect optical system may produce aberrations, which may result from factors such as the irregular shape of the lens, the inhomogeneity of the material, or errors during assembly. With the FIS4 sensor, the full picture of the wave front can be captured and the aberrations quantified using Zernike polynomials. This method can accurately quantify local changes in wavefront and assist in identifying different types of aberrations, such as spherical aberration, coma, astigmatism, field curvature and distortion. A significant advantage of the FIS4 sensor is its simple operability and strong ability to adapt to environmental changes, making it ideal for optical quality control and optical component evaluation. By providing detailed wavefront measurements, the sensor can not only help find defects in optical systems, but also guide optical design improvements and optimizations

Measurement advantage

Complete measurement with a single frame

◆ Wave front distribution

◆ Strength distribution

◆ Image quality evaluation

High resolution

◆ Up to 512×512 phase sampling points

◆ High dynamic range

◆ Nanoscale sensitivity

Easy to adjust integration

◆ Small and compact

◆ Support parallel and convergent beams

◆ Super vibration resistance

Measurement example

▎Optical system aberration measurement optical path

▎Optical system aberration

Measurement demonstration

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CONTACT

7X24小时电话周一至周六 9:00-18:00

0757-6668-88268

Hangzhou Zernike Optical Technology Co., LTD
Full range of authorized dealers

Jiangsu Yucheng light sense technology Co., LTD

Email：

Dana@zernikeoptics.cn

电话：0757-666888268

传真：0757-666999368

公司地址：佛山市禅城区某某某路同某某莫大厦1208

备案号：粤ICP备100000000-1号

Record number: Su ICP for 2024068497

TEL：18012804887

EMAIL：Dana@zernikeoptics.cn

Address:：Nanjing University Science Park, 8 Yuanhua Road, Xianlin, Qixia District, Nanjing, Jiangsu Province

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