Quickly and accurately capture small defects and irregularities on the wafer surface
In today's semiconductor industry, with the continuous evolution of wafer characteristics, wafer surface topography measurement has become one of the key links in semiconductor manufacturing process. Microscopic defects on the wafer surface, such as cracks, chips and scratches, can seriously affect the performance and reliability of the wafer, which in turn affects the assembled electronic device. Therefore, in order to ensure device performance and improve the consistency of the manufacturing process, detailed detection of wafer surface defects is essential. This measurement not only helps to catch timely manufacturing defects, but also provides valuable data support for subsequent process optimization and quality control.
The FIS4 wavefront interference sensor, with its leading wavefront detection technology, is able to quickly and accurately capture small defects and irregularities on the wafer surface, providing a fast and efficient wafer shape detection solution to ensure quality assurance and performance optimization in semiconductor manufacturing.
Measurement advantage
No reference surface required to avoid impact
High energy pulse beam quality detection
Common channel interference, strong anti-noise ability
On-site, real-time, online detection
Industry application field
▎wafer
▎Wafer shape detection
▎Wafer shape detection
Quickly, efficiently and accurately evaluate the microscopic unevenness of the wafer surface
With the advancement of semiconductor technology, the feature size of wafers continues to shrink, and the requirements for precision in the manufacturing process are increasingly stringent. The control of wafer roughness is very important to improve the performance and yield of integrated circuits. Excessive roughness will affect the function and reliability of the circuit, so it is particularly critical to accurately measure the microstructure of the wafer surface. Interference sensors play an important role in the field of wafer surface roughness detection because of their high resolution and non-contact detection.
FIS4 wavefront interference sensor with advanced wavefront detection technology, can quickly, effectively and accurately assess the surface of the wafer surface of the microscopic unsmoothness, so as to ensure quality control during wafer processing, optimize product performance, is an indispensable inspection tool in modern semiconductor manufacturing.
Measurement advantage
No reference surface required to avoid impact
High energy pulse beam quality detection
Common channel interference, strong anti-noise ability
On-site, real-time, online detection
Industry application field
▎Wafer roughness measurement
▎Wafer roughness measurement
▎Wafer roughness measurement
Accurately identify tiny defects in wafer patterns
In the context of the rapid development of the semiconductor industry, the process of chip manufacturing is becoming increasingly complex, accompanied by technological breakthroughs, the miniaturization of circuit units is also increasing, which makes the appearance of defects in the production process become more common. Precise defect detection of wafer patterns has become particularly critical, requiring detailed inspection of wafers that have completed all or part of the process in order to identify and deal with anomalies in the process in a timely manner. This process can not only detect and eliminate the root cause of defects as early as possible, but also eliminate defective samples in time to prevent further processing, thereby protecting the yield and efficiency of production.
The FIS4 wavefront interference sensor provides a fast and efficient inspection solution in this regard, which can accurately identify tiny defects in wafer patterns, ensuring the quality and reliability of semiconductor manufacturing.
Measurement advantage
No reference surface required to avoid impact
High energy pulse beam quality detection
Common channel interference, strong anti-noise ability
On-site, real-time, online detection
Industry application field
▎Wafer pattern detection
▎Wafer pattern detection and matching
▎The cut wafer repeats the substructure sequence
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