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FIS4-UV Ultraviolet Wavefront Sensor Boosts Semiconductor/Lithography Industry Development!

2025-05-23 00:00:00

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Homegrown Innovation, Pushing Boundaries, Powering Precision Measurement

In the semiconductor and lithography industries, high-precision wave-front metrology sensors are one of the key components. They can monitor and correct errors in the optical system of lithography machines in real-time, thereby improving lithography quality and yield.

The FIS4-UV ultraviolet wave-front metrology sensor plays a crucial role in the semiconductor and lithography industries. This sensor boasts features such as high resolution, achromatic performance, exceptionally strong vibration resistance, and high sensitivity (2nm RMS). It can provide critical wavefront aberration data for semiconductor manufacturing and lithography technology, efficiently boosting productivity and product quality, thus driving the semiconductor industry forward at an accelerated pace.




The FIS4-UV interferometer sensor (shown in Figure 1) is specifically designed for ultraviolet (UV) band detection applications. It features a high resolution of 512×512 and a large sensor area of 13.3mm × 13.3mm. It supports deep UV light sources at 192nm, as well as multiple other UV bands from 200nm to 400nm.

图片

(Figure 1) FIS4-UV Interferometer Sensor


Applications of the FIS4-UV Wavefront Sensor


Semiconductor Manufacturing Process Monitoring:

In semiconductor manufacturing, the FIS4-UV can monitor the surface morphology and optical properties of wafers in real time to ensure consistency and quality throughout the fabrication process. It helps engineers promptly identify issues and make adjustments, thereby boosting production efficiency and product quality.



光学系统校准测量示例


Metasurface Wavefront Measurement Example


Optical Component Inspection:

The FIS4-UV can inspect the surface morphology and refractive index distribution of optical components like lenses and mirrors.

Specifically, the FIS4-UV can measure parameters such as surface form, radius of curvature, refractive index distribution, transmitted wavefront variation, and MTF (Modulation Transfer Function) curve for lenses, lens assemblies, flat mirrors, and spherical mirrors. This allows for a comprehensive assessment of the quality and performance of these optical components.

END


Zernike Optical Technology, in collaboration with Yucheng Optical Sensing, stands at the forefront of technology, continuously expanding the functional boundaries of the FIS4 interferometer sensor to serve more extreme operating conditions and innovative scenarios. We invite you to join us on a new journey in high-end manufacturing, fostering win-win cooperation!



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