Frontier Applications of the FIS4-NIR Infrared Wavefront Sensor

【Domestically Developed, Innovatively Breakthrough, Empowering Precision Measurement】

The near-infrared (NIR) band (900nm-1200nm) holds significant value in both space and terrestrial applications. It's widely used in military reconnaissance, astronomical observation, environmental monitoring, industrial inspection, and medical diagnostics, and is particularly indispensable in the design and verification of optical systems.

However, traditional wave-front metrology techniques face numerous challenges in this band, such as the interference of light source coherence on measurement accuracy, which severely limits the achievement of high-precision wave-front metrology. The FIS4-NIR, based on common-path Quadriwave Lateral Shearing Interferometry, has developed a high-precision wave-front metrology solution specifically for the near-infrared band.

The FIS4-NIR interferometer sensor (shown in Figure 1) is specifically designed for infrared (IR) band detection applications. It features a high resolution of 512×512 and a large sensor area of 13.3mm × 13.3mm, offering a large dynamic range of up to 260μm. It supports high-precision wave-front metrology within multiple infrared bands ranging from 900nm to 1200nm.

(Figure 1) FIS4-NIR Interferometer Sensor

Optical System Aberration Measurement：

In the testing and alignment of high-precision optical systems, the FIS4-NIR can monitor the system's wavefront aberrations in real time, ensuring imaging quality and system consistency for optical components within the near-infrared band (900nm-1200nm). Its high-resolution and large-area design helps engineers quickly identify wavefront distortions in optical systems, guiding precise adjustments to improve system performance and stability.

光学系统像差测量示例

Metasurface Wavefront Measurement：

In the research, development, and performance verification of metasurface devices, the FIS4-NIR can precisely measure their modulation effect on near-infrared light fields. By reconstructing complex wavefronts in real-time, engineers can accurately evaluate the metasurface's phase modulation capability over incident waves, promptly optimize design parameters, and enhance the device's functional efficiency and manufacturing yield.