The phase change of the laser beam as it passes through the plasma is monitored in real time and the density of electrons in the plasma is derived

Gas plasma measurement techniques focus on the physical properties of gases in high energy states, where some or all of the gas atoms are ionized to produce charged particles such as ions and free electrons. The measurement of the fundamental properties of these plasmas, including temperature, density, charge state and chemical composition, is critical to controlling plasma-related processes, optimizing their performance in industrial applications, and advancing scientific research.

In the diagnosis of plasma, the FIS4 four-wave interference sensor is able to monitor the phase change of the laser beam as it passes through the plasma in real time. By measuring this phase change, the density of electrons in the plasma can be derived. This kind of real-time measurement is of great value for accurately controlling plasma parameters, monitoring their changes in real time and optimizing the process flow.

Measurement advantage

Complete measurement with a single frame

 

◆ Wave front distribution

◆ Aberration analysis

◆ Beam parameter analysis

High resolution

 

◆ Up to 512×512 phase sampling points

◆ High dynamic range

◆ Nanoscale sensitivity

Easy to adjust integration

 

◆ Small and compact

◆ Support parallel and convergent beams

◆ Super vibration resistance

Measurement example

Gas plasma density measurement optical path

Measurement demonstration

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