Analyze and characterize materials and devices at the micro and nano scale, providing high-resolution and highly sensitive measurements
The application of Four-wave Lateral Shearing Interferometry (FIS4) to transmission-micro - and nano-structure measurement provides high-resolution and sensitive measurements for the analysis and characterization of materials and devices at the micro - and nano-scale. Applications of the FIS4 technique in transmissible micro/nano structure inspection may include:
1. Morphology analysis of micro and nano structures: FIS4 technology can be used to measure the surface profile, roughness and size of micro and nano structures, which is essential to ensure the quality of micro and nano machining.
2. Film thickness measurement: FIS4 technology can measure the thickness and uniformity of films at the nanoscale, which is very important for film growth control in the semiconductor industry and materials science.
3. Performance evaluation of micro and nano gratings: FIS4 technology enables the evaluation of the linewidth, spacing and defects of micro and nano gratings, which is essential for the manufacture and quality control of optical and photonics components.
4. Detection of photonic crystals and optical waveguides: FIS4 technology can detect the periodic structure of photonic crystals and the waveguide characteristics of optical waveguides for optimizing the design and performance of photonic integrated circuits.
5. Quality control of biochips and microfluidic chips: In the manufacturing process of biochips and microfluidic chips, FIS4 technology can be used to detect the size, shape and uniformity of the microchannel to ensure its function and reliability.
6. Microelectromechanical systems (MEMS) detection: FIS4 technology can be used to detect displacement, vibration and deformation of MEMS components, which is very useful for evaluating the performance and stability of MEMS devices.
7. Characterization of nanopores and nanochannels: In nanofluidics and molecular screening applications, FIS4 technology can be used to characterize the geometric parameters of nanopores and nanochannels.
8. Detection of layered materials: FIS4 technology can be used to detect the number and quality of layered materials such as graphene.
Due to the FIS4 technology's ability to make precise measurements without touching the sample, it is particularly suitable for micro and nano structures that are sensitive to pressure and contact. In addition, the high spatial resolution and phase resolution provided by the FIS4 technology make it an ideal tool for analyzing micro - and nano-scale features.
In practical applications, the FIS4 system needs to be optimized for the specific characteristics of the micro-nano structure and measurement requirements, such as adjusting the wavelength of the light source, enhancing the system's vibration resistance, and improving the data processing algorithm to ensure the ideal measurement results.
Measurement advantage
Complete measurement with a single frame
◆ Microtopography measurement
◆ 3D topography analysis
◆ Support white light lighting
High resolution
◆ Up to 512×512 phase sampling points
◆ High dynamic range
◆ Nanoscale sensitivity
Easy to adjust integration
◆ Small and compact
◆ Support parallel and convergent beams
◆ Super vibration resistance
Measurement example
▎Detection of optical path through micro - nano structure
▎Through micro and nano structure detection
Measurement demonstration
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