Identify and correct aberrations in optical systems with high accuracy to improve the imaging quality of the system
The application of FIS4 four-wave shear interferometry technology in optical system calibration is mainly based on its ability to measure wavefront errors with high precision, which can identify and correct aberrations in optical systems with high precision and improve the imaging quality of the system. It provides accurate measurement methods for aberration identification, system performance evaluation, optical component adjustment, feedback control, thermal stability of optical systems, etc., which helps to improve the accuracy and reliability of optical systems, and will become an indispensable tool in modern optical engineering.
Measurement advantage
Complete measurement with a single frame
◆ Wave front distribution
◆ Aberration analysis
◆ Image quality evaluation
High resolution
◆ Up to 512×512 phase sampling points
◆ High dynamic range
◆ Nanoscale sensitivity
Easy to adjust integration
◆ Small and compact
◆ Support parallel and convergent beams
◆ Super vibration resistance
Related products
